Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering

Bernd Szyszka; V. Sittinger; Xin Jiang; Ruijiang Hong; Wolfgang Werner; Andreas Pflug; M. Ruske; A. Lopp

doi:10.1016/s0040-6090(03)00968-4

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Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering

Bernd Szyszka V. Sittinger Xin Jiang Ruijiang Hong Wolfgang Werner Andreas Pflug M. Ruske A. Lopp

Year: 2003 Journal: Thin Solid Films Vol: 442 (1-2)Pages: 179-183 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(03)00968-4

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Keywords:

Materials science Sputtering Thin film Sputter deposition Cavity magnetron Optoelectronics Substrate (aquarium) Coating Sheet resistance Electrical resistivity and conductivity Composite material Analytical Chemistry (journal) Nanotechnology Layer (electronics) Chemistry Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering

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