JOURNAL ARTICLE

Charge transport in hydrogenated boron-doped nanocrystalline silicon-silicon carbide alloys

Seung Yeop MyongOleg ShevaleevskiyKoeng Su LimShinsuke MiyajimaMakoto Konagai

Year: 2005 Journal:   Journal of Applied Physics Vol: 98 (5)   Publisher: American Institute of Physics

Abstract

We have investigated the carrier transport mechanism of mixed-phased hydrogenated boron-doped nanocrystalline silicon–silicon carbide alloy (p-nc-Si-SiC:H) films. From temperature-dependent dark conductivity measurements, we found that the p-nc-Si-SiC:H alloys have two different carrier transport mechanisms: one is the thermally activated hopping between neighboring crystallites near the room-temperature region and the other is the band tail hopping below 150 K.

Keywords:
Materials science Silicon carbide Nanocrystalline material Nanocrystalline silicon Silicon Doping Boron Wide-bandgap semiconductor Alloy Electrical resistivity and conductivity Charge carrier Boron carbide Polycrystalline silicon Metallurgy Optoelectronics Nanotechnology Crystalline silicon Amorphous silicon Chemistry Thin-film transistor

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Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon Carbide Semiconductor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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