Reactive magnetron sputtering of TiO films

Pavel Baroch; J. Musil; J. Vlček; K.H. Nam; Jung‐Hoon Han

doi:10.1016/j.surfcoat.2004.07.060

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JOURNAL ARTICLE

Reactive magnetron sputtering of TiO films

Pavel Baroch J. Musil J. Vlček K.H. Nam Jung‐Hoon Han

Year: 2004 Journal: Surface and Coatings Technology Vol: 193 (1-3)Pages: 107-111 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2004.07.060

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Keywords:

Materials science Amorphous solid Sputter deposition Sputtering Stoichiometry Oxide Cavity magnetron Thin film Analytical Chemistry (journal) Oxygen Transition metal Partial pressure Chemical engineering Deposition (geology) Hysteresis Nanotechnology Metallurgy Crystallography Chemistry Physical chemistry Condensed matter physics

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TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Reactive magnetron sputtering of TiO films

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