Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation

Frederick O. Adurodija; H. Izumi; Tohru Ishihara; Hideki Yoshioka; Kazutoshi Yamada; Hiroshi Matsui; Munekazu Motoyama

doi:10.1016/s0040-6090(99)00278-3

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Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation

Frederick O. Adurodija H. Izumi Tohru Ishihara Hideki Yoshioka Kazutoshi Yamada Hiroshi Matsui Munekazu Motoyama

Year: 1999 Journal: Thin Solid Films Vol: 350 (1-2)Pages: 79-84 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(99)00278-3

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Keywords:

Torr Materials science Indium tin oxide Thin film Pulsed laser deposition Substrate (aquarium) Analytical Chemistry (journal) Laser ablation Electrical resistivity and conductivity Indium Transparent conducting film Optoelectronics Laser Optics Nanotechnology Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Sensor Technologies Research

Physical Sciences → Engineering → Biomedical Engineering

Highly conducting indium tin oxide (ITO) thin films deposited by pulsed laser ablation

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