JOURNAL ARTICLE

Mechanism of Hypophosphite‐Reduced Electroless Copper Plating

Aina HungKer‐Ming Chen

Year: 1989 Journal:   Journal of The Electrochemical Society Vol: 136 (1)Pages: 72-75   Publisher: Institute of Physics

Abstract

Effects of nickel deposit and boric acid of hypophosphite‐reduced electroless copper plating were studied by cyclic voltammetry. Nickel deposit can catalyze the oxidation of hypophosphite, and boric acid can enhance the reduction of nickel ion. In conjunction with the results of EPR studies of copper (II) complex ion and data of stability constants of copper (II) complex ion, it was found that the rate‐determining step in hypophosphite‐reduced electroless copper is the reduction of copper (II) complex ion and only those copper (II) complex ions that form dimeric structures have a significant plating rate.

Keywords:
Hypophosphite Copper Inorganic chemistry Chemistry Nickel Boric acid Cyclic voltammetry Copper plating Electroless nickel plating Ion Electrochemistry Electroless plating Electrode Organic chemistry Physical chemistry

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0.42
FWCI (Field Weighted Citation Impact)
1
Refs
0.62
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Citation History

Topics

Electrodeposition and Electroless Coatings
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Corrosion Behavior and Inhibition
Physical Sciences →  Materials Science →  Materials Chemistry
Electrochemical Analysis and Applications
Physical Sciences →  Chemistry →  Electrochemistry

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