Low cost transparent SU-8 membrane mask for deep X-ray lithography

Stefano Cabrini; F. Pérennès; Benedetta Marmiroli; Alessandro Olivo; Alessandro Carpentiero; Rakesh Kumar; Patrizio Candeloro; Enzo Di Fabrizio

doi:10.1007/s00542-004-0473-5

JOURNAL ARTICLE

Low cost transparent SU-8 membrane mask for deep X-ray lithography

Stefano Cabrini F. Pérennès Benedetta Marmiroli Alessandro Olivo Alessandro Carpentiero Rakesh Kumar Patrizio Candeloro Enzo Di Fabrizio

Year: 2005 Journal: Microsystem Technologies Vol: 11 (4-5)Pages: 370-373 Publisher: Springer Science+Business Media

DOI: 10.1007/s00542-004-0473-5

Get Full-Text PDF Get Analytical Report

Keywords:

Electroforming Fabrication Lithography Materials science X-ray lithography Next-generation lithography Membrane Optics Photolithography Resist Optical transparency Optoelectronics Photoresist Diamond Nanotechnology Electron-beam lithography Layer (electronics) Composite material Physics

Metrics

Cited By

0.64

FWCI (Field Weighted Citation Impact)

Refs

0.72

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced X-ray Imaging Techniques

Physical Sciences → Physics and Astronomy → Radiation

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Low cost transparent SU-8 membrane mask for deep X-ray lithography

Metrics

Citation History

Topics

Related Documents

SU-8 based deep x-ray lithography/LIGA

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

High precision, low cost mask for deep x-ray lithography

Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography

SU-8 as resist material for deep X-ray lithography