Proximity-effect correction in electron-beam lithography

Abstract

A survey is given of the dose correction method we have developed to compensate for the proximity effect. Accurate values for the parameters of the double Gaussian function have been obtained with the doughnut method. A self-consistent correction method has been implemented that is not limited to rectangles, which is successful in correcting polygons by splitting them into trapezoids and computing the interactions between these trapezoids. By applying a clustering technique, the speed of this correction software has been remarkably increased. Furthermore, programs have been developed to perform different fracturing strategies on the input pattern. Also the influence of the various fracturing methods on the quality of the correction can be checked by software. In this way, time consuming experiments can be avoided.