Rare earth-doped alumina thin films deposited by liquid source CVD processes

Jean‐Luc Deschanvres; W. Meffre; J.C. Joubert; J.P. Sénateur; F. Robaut; Jean‐Emmanuel Broquin; R. Rimet

doi:10.1016/s0925-8388(98)00433-2

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Rare earth-doped alumina thin films deposited by liquid source CVD processes

Jean‐Luc Deschanvres W. Meffre J.C. Joubert J.P. Sénateur F. Robaut Jean‐Emmanuel Broquin R. Rimet

Year: 1998 Journal: Journal of Alloys and Compounds Vol: 275-277 Pages: 742-745 Publisher: Elsevier BV

DOI: 10.1016/s0925-8388(98)00433-2

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Keywords:

Doping Materials science Neodymium Thin film Amorphous solid Refractive index Erbium Rare earth Deposition (geology) Chemical vapor deposition Mineralogy Analytical Chemistry (journal) Chemical engineering Optics Optoelectronics Nanotechnology Chemistry Metallurgy Laser Crystallography Geology

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Glass properties and applications

Physical Sciences → Materials Science → Ceramics and Composites

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Luminescence Properties of Advanced Materials

Physical Sciences → Materials Science → Materials Chemistry

Rare earth-doped alumina thin films deposited by liquid source CVD processes

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