JOURNAL ARTICLE

Optical Absorption Properties of Indium-Doped Thin Crystalline Silicon Films

Hiroto KasaiHideki Matsumura

Year: 1998 Journal:   Japanese Journal of Applied Physics Vol: 37 (10R)Pages: 5609-5609   Publisher: Institute of Physics

Abstract

The optical absorption of indium-doped thin crystalline silicon films is investigated for photon energies from 1.24 to 2.75 eV (450 to 1000 nm) by transmittance measurements. It is found that the optical absorption coefficient of indium-doped silicon films increases not only in the infrared region but also in the visible region of the spectrum by increasing the concentration of indium impurities below the solid solubility limit of about 10 18 cm -3 . It is also revealed that this enhancement is more dominant when the sample is thinner than 10 µm. These results imply that In doping is effective in increasing the optical absorption of indirect-band-gap materials such as crystalline silicon.

Keywords:
Indium Silicon Materials science Doping Absorption (acoustics) Transmittance Band gap Impurity Attenuation coefficient Free carrier absorption Thin film Infrared Absorption edge Crystalline silicon Analytical Chemistry (journal) Optoelectronics Optics Chemistry Nanotechnology

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23
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0.75
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Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

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