Characterization of CNx films prepared by reactive magnetron sputtering

Yuki Togashi; Yuko HIROHATA; Tomoaki Hino

doi:10.1016/s0042-207x(02)00160-4

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Characterization of CNx films prepared by reactive magnetron sputtering

Yuki Togashi Yuko HIROHATA Tomoaki Hino

Year: 2002 Journal: Vacuum Vol: 66 (3-4)Pages: 391-395 Publisher: Elsevier BV

DOI: 10.1016/s0042-207x(02)00160-4

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Keywords:

Knoop hardness test Analytical Chemistry (journal) Argon Materials science Raman spectroscopy Substrate (aquarium) Sputtering X-ray photoelectron spectroscopy Carbon nitride Biasing Sputter deposition Nitride Cavity magnetron Thin film Indentation hardness Chemistry Composite material Microstructure Nanotechnology Optics Nuclear magnetic resonance Voltage Layer (electronics)

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Characterization of CNx films prepared by reactive magnetron sputtering

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