JOURNAL ARTICLE
Amorphous NbO films prepared by reactive evaporation
J. R. DingXia ZhouJianwei BaiB. X. Liu
Year: 1990 Journal: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Vol: 8 (4)Pages: 3349-3351 Publisher: American Institute of Physics
Abstract
Reactive evaporation technique was employed to produce amorphous NbO thin films directly. It was revealed that the sheet electrical resistance of the amorphous NbO films was much greater than that of the crystalline counterpart. The thermal stability of the amorphous NbO films was studied by in situ annealing, and the crystallization temperature of the amorphous NbO was observed to be 1120±50 K. The amorphous NbO thin films also crystallized upon 250 keV Xe+ irradiation to a dose of 5×1015 Xe+/cm2.
Keywords:
Amorphous solid Natural bond orbital Materials science Crystallization Annealing (glass) Chemical engineering Thermal stability Thin film Analytical Chemistry (journal) Crystallography Nanotechnology Chemistry Composite material Organic chemistry Molecule
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0
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0.64
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Citation History
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Photorefractive and Nonlinear Optics
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Transition Metal Oxide Nanomaterials
Physical Sciences → Materials Science → Polymers and Plastics
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