DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction

Takafumi Aoi; Nobuto Oka; Yasushi Sato; Ryo Hayashi; Hideya Kumomi; Yuzo Shigesato

doi:10.1016/j.tsf.2009.09.176

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DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction

Takafumi Aoi Nobuto Oka Yasushi Sato Ryo Hayashi Hideya Kumomi Yuzo Shigesato

Year: 2009 Journal: Thin Solid Films Vol: 518 (11)Pages: 3004-3007 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2009.09.176

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Keywords:

Amorphous solid Gallium Sputtering Materials science Sputter deposition Indium Zinc Analytical Chemistry (journal) Electrical resistivity and conductivity Deposition (geology) Cavity magnetron Thin film Optoelectronics Inorganic chemistry Nanotechnology Chemistry Metallurgy Electrical engineering Crystallography

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction

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