Cr-doped TiO2 thin films deposited by RF-sputtering

Tae Ho Jun; Kee Sun Lee

doi:10.1016/j.matlet.2010.07.069

ScienceGate Book Chapters

JOURNAL ARTICLE

Cr-doped TiO2 thin films deposited by RF-sputtering

Tae Ho Jun Kee Sun Lee

Year: 2010 Journal: Materials Letters Vol: 64 (21)Pages: 2287-2289 Publisher: Elsevier BV

DOI: 10.1016/j.matlet.2010.07.069

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Rutile Anatase Doping Thin film Band gap Phase (matter) Sputtering Mixed phase Chemical engineering Analytical Chemistry (journal) Nanotechnology Optoelectronics Photocatalysis Organic chemistry Chemistry Catalysis

Metrics

Cited By

0.83

FWCI (Field Weighted Citation Impact)

Refs

0.75

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Cr-doped TiO2 thin films deposited by RF-sputtering

Metrics

Citation History

Topics

Related Documents

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Photocatalytic activity of TiO2 thin films deposited by RF magnetron sputtering

Transparent conductive Nb-doped TiO2 films deposited by RF magnetron co-sputtering

Hydrophilic properties of nano-TiO2 thin films deposited by RF magnetron sputtering

Optoelectronic properties of Cr doped ZnO thin films deposited by RF magnetron sputtering using a powder target