Fluorinated polyimide–silica films with low permittivity and low dielectric loss

Yihe Zhang; Yu Li; Qingsong Su; Hong Zheng; Haitao Huang; H.L.W. Chan

doi:10.1007/s10853-011-5990-x

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Fluorinated polyimide–silica films with low permittivity and low dielectric loss

Yihe Zhang Yu Li Qingsong Su Hong Zheng Haitao Huang H.L.W. Chan

Year: 2011 Journal: Journal of Materials Science Vol: 47 (4)Pages: 1958-1963 Publisher: Springer Science+Business Media

DOI: 10.1007/s10853-011-5990-x

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Keywords:

Polyimide Materials science Scanning electron microscope Hydrofluoric acid Dielectric Fourier transform infrared spectroscopy Microelectronics Permittivity Sol-gel Porosity Chemical engineering Composite material Polymer chemistry Nanotechnology Layer (electronics) Optoelectronics

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Synthesis and properties of polymers

Physical Sciences → Materials Science → Polymers and Plastics

Silicone and Siloxane Chemistry

Physical Sciences → Materials Science → Materials Chemistry

Polymer Nanocomposites and Properties

Physical Sciences → Materials Science → Polymers and Plastics

Fluorinated polyimide–silica films with low permittivity and low dielectric loss

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