Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Masashi Tamura; Shinzo Yoshikado

doi:10.1016/s0257-8972(03)00070-7

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Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Masashi Tamura Shinzo Yoshikado

Year: 2003 Journal: Surface and Coatings Technology Vol: 169-170 Pages: 203-207 Publisher: Elsevier BV

DOI: 10.1016/s0257-8972(03)00070-7

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Keywords:

Reactive-ion etching Materials science Etching (microfabrication) Fluorine Plasma Plasma etching Ion Crystal (programming language) Dry etching Analytical Chemistry (journal) Optoelectronics Nanotechnology Metallurgy Environmental chemistry Chemistry Organic chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photorefractive and Nonlinear Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

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