JOURNAL ARTICLE

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Masashi TamuraShinzo Yoshikado

Year: 2003 Journal:   Surface and Coatings Technology Vol: 169-170 Pages: 203-207   Publisher: Elsevier BV
Keywords:
Reactive-ion etching Materials science Etching (microfabrication) Fluorine Plasma Plasma etching Ion Crystal (programming language) Dry etching Analytical Chemistry (journal) Optoelectronics Nanotechnology Metallurgy Environmental chemistry Chemistry Organic chemistry

Metrics

15
Cited By
0.31
FWCI (Field Weighted Citation Impact)
1
Refs
0.60
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photorefractive and Nonlinear Optics
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Optical Coatings and Gratings
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

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