Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

B. Arvan; A. Khakifirooz; Roohollah Samadzadeh Tarighat; S. Mohajerzadeh; A. Goodarzi; Ebrahim Asl Soleimani; Ezatollah Arzi

doi:10.1016/j.mseb.2003.10.119

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Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

B. Arvan A. Khakifirooz Roohollah Samadzadeh Tarighat S. Mohajerzadeh A. Goodarzi Ebrahim Asl Soleimani Ezatollah Arzi

Year: 2004 Journal: Materials Science and Engineering B Vol: 109 (1-3)Pages: 17-23 Publisher: Elsevier BV

DOI: 10.1016/j.mseb.2003.10.119

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Keywords:

Chemical vapor deposition Titanium dioxide Materials science Deposition (geology) Atmospheric pressure Chemical engineering Environmental chemistry Chemistry Nanotechnology Composite material Geology Meteorology Physics

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

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