Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings

Nicole Wagner; W. W. Gerberich; J. Heberlein

doi:10.1016/j.surfcoat.2006.08.047

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Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings

Nicole Wagner W. W. Gerberich J. Heberlein

Year: 2006 Journal: Surface and Coatings Technology Vol: 201 (7)Pages: 4168-4173 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2006.08.047

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Keywords:

Materials science Hydrogen Chemical vapor deposition Plasma-enhanced chemical vapor deposition Analytical Chemistry (journal) Amorphous solid Scanning electron microscope Substrate (aquarium) Thin film Chemical engineering Composite material Nanotechnology Crystallography Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Thermal plasma chemical vapor deposition of wear-resistant, hard Si–C–N coatings

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