By a slight modification of the Ti-incorporation manner a new LiF TLD material has been developed with improved properties concerning thermal treatments necessary in application. To obtain optimal TL response not quenching but slow cooling is used. Further, as the TL prepeaks are very low, the usual long time 80°C annealing cycle can be avoided. A new TL peak 5' positioned between TL peak 4 and 5 of conventional material turns out to be the TLD relevant main peak. The thermal and optical behaviour of lattice defects responsible for TL peak 5' markedly differ from those leading to TL peak 5.
C. J. KarzmarkJohn WhiteJ. F. Fowler
E W MasonA.F. McKinlayI. Clark
Sven BennerMoa JohanssonB. Lindskoug