JOURNAL ARTICLE

Photo-induced reversible change of Urbach edge in hydrogenated amorphous silicon

Daxing HanChanghua QiuWenhao Wu

Year: 1986 Journal:   Chinese Physics Letters Vol: 3 (7)Pages: 297-300   Publisher: Institute of Physics

Abstract

Photoconductivity spectra temperature dependence combining with transmission measurements have been formed on hydrogenated amorphous silicon. After exposure by AM1 light a reversible increase of 6% of the Urbach parameter E0(T,X) has been observed. This is a direct evidence for the fact that photo-induced changes in a-Si:H create not only metastable defects but also affect the topological disorder.

Keywords:
Metastability Amorphous silicon Materials science Photoconductivity Amorphous solid Silicon Enhanced Data Rates for GSM Evolution Optoelectronics Condensed matter physics Crystalline silicon Chemical physics Crystallography Chemistry Physics Telecommunications Computer science

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
9
Refs
0.11
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

JOURNAL ARTICLE

Reversible Photo-Induced Structural Change in Hydrogenated Amorphous Silicon

Kousaku Shimizu ShibaTakashi TabuchiH. Okamoto

Journal:   Japanese Journal of Applied Physics Year: 1997 Vol: 36 (1R)Pages: 29-29
JOURNAL ARTICLE

Photo-induced reversible change of topological disorder in hydrogenated amorphous silicon

Daxing HanChanghua QuiWenhao Wu

Journal:   Philosophical Magazine B Year: 1986 Vol: 54 (1)Pages: L9-L13
JOURNAL ARTICLE

Photo-induced refractive index change in hydrogenated amorphous silicon oxynitride

Hiromitsu KatoMakoto FujimakiTakashi NomaYoshimichi Ohki

Journal:   Journal of Applied Physics Year: 2002 Vol: 91 (10)Pages: 6350-6353
JOURNAL ARTICLE

Photo-Induced Degradation and Structural Change in Hydrogenated Amorphous Silicon.

Kousaku ShimizuH. Okamoto

Journal:   Journal of the Society of Materials Science Japan Year: 2001 Vol: 50 (4)Pages: 368-371
JOURNAL ARTICLE

Urbach edge and the density of states in hydrogenated amorphous silicon

T. TiedjeB. AbelesJ. M. Cebulka

Journal:   Solid State Communications Year: 1983 Vol: 47 (6)Pages: 493-496
© 2026 ScienceGate Book Chapters — All rights reserved.