Approach for High Aspect Ratio Pattern Transfer by Nanoimprint Lithography using Mixture Polymers of Molecular Weights

Abstract

We propose a mixture molecular resist system consisting of high and low molecular weight resins to achieve fine and high aspect ratio pattern fabrication by nanoimprint lithography. Poly-methyl methacrylate (PMMA) with molecular weights of 50,000 g/mol and that of 350,000 g/mol are mixed. Using the mixture polymer, thermal nanoimprint is examined. The resist system is good for easy deformation into narrow patterns by low-molecular-weight components and reinforces stiffness at the pattern’s root portion against mold releasing defects by high molecular weight components. We confirm a fine pattern transfer using the proposed resist.