Magnetron sputtering process of carbon-doped α-Fe2O3 thin films for photoelectrochemical water splitting

Mao-Chia Huang; Wen-Sheng Chang; Jing-Chie Lin; Yu‐Hsu Chang; Ching-Chen Wu

doi:10.1016/j.jallcom.2015.02.166

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Magnetron sputtering process of carbon-doped α-Fe2O3 thin films for photoelectrochemical water splitting

Mao-Chia Huang Wen-Sheng Chang Jing-Chie Lin Yu‐Hsu Chang Ching-Chen Wu

Year: 2015 Journal: Journal of Alloys and Compounds Vol: 636 Pages: 176-182 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2015.02.166

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Keywords:

Materials science Photocurrent Raman spectroscopy Thin film Analytical Chemistry (journal) Annealing (glass) Doping Sputter deposition Scanning electron microscope Band gap Sputtering Optoelectronics Optics Chemistry Nanotechnology Metallurgy

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Iron oxide chemistry and applications

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Magnetron sputtering process of carbon-doped α-Fe2O3 thin films for photoelectrochemical water splitting

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