Initial growth of GaN on α-Al2O3(0001) by molecular beam epitaxy

Abstract

The sapphire surface, used for growth of GaN by molecular beam epitaxy, was studied by reflection high-energy electron diffraction during the in situ pretreatment and initial growth. We investigated the effect of Ga cleaning, nitridation, and growth of the AlN nucleation layer on the lattice constant. One Ga-cleaning cycle restored the surface with a higher diffraction density. Nitridation changed the lattice constant instantaneously. The lattice constant was restored if the nitridation was switched off. For the AlN nucleation layer, the first monolayer was strained, followed by first a rapid and then a slow relaxation.