Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

R. Bilenchi; I. Gianinoni; M. Musci; R. Murri

doi:10.1557/proc-17-199

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Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

R. Bilenchi I. Gianinoni M. Musci R. Murri

Year: 1982 Journal: MRS Proceedings Vol: 17 Publisher: Cambridge University Press

DOI: 10.1557/proc-17-199

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Keywords:

Materials science Silane Substrate (aquarium) Amorphous silicon Laser Amorphous solid Silicon Chemical vapor deposition Hydrogen Photodissociation Deposition (geology) Analytical Chemistry (journal) Optoelectronics Photochemistry Optics Composite material Crystalline silicon Organic chemistry

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

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