Deep reactive ion etching of Pyrex glass using SF6 plasma

Xinghua Li; Takashi Abe; Masayoshi Esashi

doi:10.1016/s0924-4247(00)00482-9

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Deep reactive ion etching of Pyrex glass using SF6 plasma

Xinghua Li Takashi Abe Masayoshi Esashi

Year: 2001 Journal: Sensors and Actuators A Physical Vol: 87 (3)Pages: 139-145 Publisher: Elsevier BV

DOI: 10.1016/s0924-4247(00)00482-9

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Keywords:

Reactive-ion etching Plasma Etching (microfabrication) Materials science Ion Plasma etching Deep reactive-ion etching Analytical Chemistry (journal) Optoelectronics Composite material Chemistry Chromatography Organic chemistry Physics Nuclear physics

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Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Deep reactive ion etching of Pyrex glass using SF6 plasma

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