Atomic bonds in boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

Chiharu Kimura; Hiroshi Sota; Hidemitsu Aoki; Takashi Sugino

doi:10.1016/j.diamond.2008.12.004

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Atomic bonds in boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

Chiharu Kimura Hiroshi Sota Hidemitsu Aoki Takashi Sugino

Year: 2009 Journal: Diamond and Related Materials Vol: 18 (2-3)Pages: 478-481 Publisher: Elsevier BV

DOI: 10.1016/j.diamond.2008.12.004

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Keywords:

Chemical vapor deposition Boron nitride Boron Plasma Plasma-enhanced chemical vapor deposition Carbon film Carbon fibers Materials science Deposition (geology) Chemical bond Carbon nitride Thin film Chemical engineering Remote plasma Nitride Nanotechnology Inorganic chemistry Chemistry Analytical Chemistry (journal) Environmental chemistry Organic chemistry Composite material Catalysis Composite number Layer (electronics) Geology Physics

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Boron and Carbon Nanomaterials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Atomic bonds in boron carbon nitride films synthesized by remote plasma-assisted chemical vapor deposition

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