Electrical conduction in thin chromium films

Abstract

We have prepared thin (50–1500 Å) polycrystalline films of Cr by vacuum (10−8 Torr) evaporation methods using the deposition rate on Corning glass 7059 and its temperature as experimental parameters. Electrical resistivity (ρ) of these films has been studied in situ as a function of temperature (T), film thickness (t), and the above preparation variables. Our films exhibit well-definied anomalies at the Néel temperature which is strongly dominated by internal stresses. The ρ vs T curves are briefly compared with those of other investigators.