Optical microlithography with nearly nondiffracting beams

Abstract

A new concept based on a Fabry-Perot interferometer for the generation of nearly nondiffracting Bessel beams is described experimentally and theoretically, and proposed for potential applications in microlithography such as the fabrication of small isolated patterns. It was demonstrated that the depth of focus can be increased by a factor of about 2, and simultaneously the transverse resolution improved by a factor of 1.6, when using this technique to image contact holes. The theoretical curves show very good agreement with the measured intensity distribution. The properties of simultaneous imaging of two contact holes were also investigated. It was shown experimentally that even in the most critical case (when the first diffraction rings overlap), undesirable interference effects between the adjacent contact holes can be eliminated by means of a phase shifting technique.