Intrinsic resputtering in pulsed-laser deposition of lead-zirconate-titanate thin films

Abstract

Pulsed-laser deposition (PLD) of lead-zirconate-titanate [Pb(Zrx,Ti1−x)O3] (PZT) thin films under low ambient pressure has been investigated by studying the angular deposition distributions of the constituent elements of the films. Nonstoichiometric profiles are observed and a dip occurs near the target surface normal of the deposition profile of lead. Experimental results show that intrinsic resputtering of the film is important in the PLD process and is responsible for the anomalous distribution of lead.