<title>Prospects For The 1:1 Electron Image Projector</title>

Abstract

The 1:1 electron image projector, with its inherent advantages of high resolution and high throughput, has the potential to perform the lithography of VLSI circuits with sub-micron dimensions at an economic price. We show here that the registration accuracy of the technique can match its high resolution capabilities. Misregistration arising from global alignment errors, mask errors, linewidth variation, wafer bowing, deflection distortion and wafer holder variations are measured using electrical techniques. The total misregistration between two levels, to be expected from a combination of all these sources amounts to a standard deviation of 0.12μm.