Crystallization of hydrogenated amorphous silicon films by pulsed ruby laser irradiation

Ho Won Lee; T.D. Lee; C.O. Park; Dong-Heon Ha; Seungchul Kim

doi:10.1016/0030-4018(89)90280-0

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Crystallization of hydrogenated amorphous silicon films by pulsed ruby laser irradiation

Ho Won Lee T.D. Lee C.O. Park Dong-Heon Ha Seungchul Kim

Year: 1989 Journal: Optics Communications Vol: 70 (2)Pages: 119-122 Publisher: Elsevier BV

DOI: 10.1016/0030-4018(89)90280-0

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Keywords:

Materials science Irradiation Amorphous solid Raman spectroscopy Amorphous silicon Optics Diffraction Crystallization Silicon Laser Crystallite Raman scattering Optoelectronics Crystallography Crystalline silicon Chemical engineering Chemistry

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Crystallization of hydrogenated amorphous silicon films by pulsed ruby laser irradiation

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