JOURNAL ARTICLE

Defects in amorphous silica: Ab initio MO calculations

M. O’KeeffeG. V. Gibbs

Year: 1984 Journal:   The Journal of Chemical Physics Vol: 81 (2)Pages: 876-879   Publisher: American Institute of Physics

Abstract

SCF-MO calculations have been carried out on a number of silicon oxy-hydroxides chosen to simulate possible defects in amorphous silica. It is concluded that Si=O double bonds and four-membered SiOSiO rings are not plausible high-concentration defects. Support is provided for Galeener’s assignment of the D1 and D2 ‘‘defect’’ bands in the Raman spectrum of amorphous silica to eight- and six-membered rings, respectively.

Keywords:
Amorphous silica Amorphous solid Raman spectroscopy Ab initio Materials science Silicon Amorphous silicon Crystallography Computational chemistry Ab initio quantum chemistry methods Molecular physics Chemistry Chemical engineering Crystalline silicon Metallurgy Molecule Organic chemistry Optics Physics

Metrics

118
Cited By
6.74
FWCI (Field Weighted Citation Impact)
16
Refs
0.98
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Glass properties and applications
Physical Sciences →  Materials Science →  Ceramics and Composites
Crystal Structures and Properties
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Zeolite Catalysis and Synthesis
Physical Sciences →  Chemistry →  Inorganic Chemistry
© 2026 ScienceGate Book Chapters — All rights reserved.