&lt;title&gt;Wafer pattern inspection using a Coherent Optical Processor&lt;/title&gt;

Xianyang Cai; F. Kvasnik

doi:10.1117/12.130299

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<title>Wafer pattern inspection using a Coherent Optical Processor</title>

Xianyang Cai F. Kvasnik

Year: 1992 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 1661 Pages: 333-344 Publisher: SPIE

DOI: 10.1117/12.130299

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Abstract

Microscope coherent optical processor (M-COP) has been configured and used to inspect the micro-patterns on a silicon wafer in real time. A technique for the measurement of the scale change of this pattern has been devised. Theoretical and experimental results showing the viability of this technique are presented.

Keywords:

Wafer Wafer-scale integration Optics Computer science Optoelectronics Computer hardware Electronic engineering Materials science Engineering Physics

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Topics

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

<title>Wafer pattern inspection using a Coherent Optical Processor</title>

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