JOURNAL ARTICLE

Monte Carlo simulation of InP and GaAs MESFETs

G. M. DunnAlison WalkerJ. H. JeffersonD C Herbert

Year: 1994 Journal:   Semiconductor Science and Technology Vol: 9 (11)Pages: 2123-2129   Publisher: IOP Publishing

Abstract

We have performed Monte Carlo simulations of InP MESFETs of lengths 0.6, 0.9 and 1.2 mu m and compared these results with those on GaAs MESFETs of the same dimensions. The direct current IV characteristics of the two materials were found to be similar though the GaAs characteristics were on the whole superior, reaching their operating point at lower drain voltages and possessing higher gains. However, oscillations in the drain current caused by changes in drain voltage in the GaAs devices were not present to the same degree in the InP devices. This difference is caused partially by the onset of the negative differential regime in InP at a higher electric field than in GaAs but the primary cause is the longer ballistic transport times in InP. This suggests that InP MESFETs may prove to have superior frequency response characteristics than GaAs MESFETs.

Keywords:
Monte Carlo method Gallium arsenide Voltage MESFET Condensed matter physics Optoelectronics Materials science Indium phosphide Physics Field-effect transistor Transistor Mathematics Quantum mechanics

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FWCI (Field Weighted Citation Impact)
20
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0.08
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Topics

Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Radio Frequency Integrated Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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