JOURNAL ARTICLE
Oxidation of glow discharge a-Si:H
Year: 1982 Journal: Solid-State Electronics Vol: 25 (9)Pages: 875-876 Publisher: Elsevier BV
Keywords:
Glow discharge Amorphous silicon Materials science Silicon Ellipsometry Amorphous solid Analytical Chemistry (journal) Oxide Layer (electronics) Silicon oxide Nanocrystalline silicon Optoelectronics Crystalline silicon Nanotechnology Plasma Chemistry Thin film Metallurgy Crystallography Environmental chemistry
Metrics
58
Cited By
6.86
FWCI (Field Weighted Citation Impact)
4
Refs
0.98
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences → Materials Science → Materials Chemistry
Laser Material Processing Techniques
Physical Sciences → Engineering → Computational Mechanics
Related Documents
JOURNAL ARTICLE
Characterized of glow-discharge deposited a-Si:H
Journal: Solar Energy Materials Year: 1980 Vol: 3 (4)Pages: 447-501
JOURNAL ARTICLE
Glow discharge deposited a-Si:H,Al thin films
J.L. AndújarJ. AndreuG. SardinJ.C. DelgadoJ. EsteveJ.L. Morenza
Journal: Solar Energy Materials Year: 1987 Vol: 15 (3)Pages: 167-173
JOURNAL ARTICLE
Non-Ohmic conduction in glow-discharge a-Si:H films
Jianhui ZhouG.L. KongDalin Zhang
Journal: Philosophical Magazine Letters Year: 1988 Vol: 58 (2)Pages: 117-122
JOURNAL ARTICLE
Growth of a-Si:H film using Glow-Discharge method.
Journal: Hyomen Kagaku Year: 1984 Vol: 5 (4)Pages: 475-484
JOURNAL ARTICLE
Glow discharge-produced binary Si:H alloy containing polysilane
Journal: Journal of Non-Crystalline Solids Year: 1985 Vol: 69 (2-3)Pages: 203-206