JOURNAL ARTICLE

Ultraviolet laser ablation of Si3N4 thin films

Yasuo TakigawaJohn C. Hemminger

Year: 1994 Journal:   Applied Surface Science Vol: 79-80 Pages: 146-151   Publisher: Elsevier BV
Keywords:
Fourier transform ion cyclotron resonance Ion Fluence Mass spectrum Laser ablation Excimer laser Amorphous solid Laser Analytical Chemistry (journal) Mass spectrometry Ion cyclotron resonance Ultraviolet Thin film Materials science Atomic physics Chemistry Optics Optoelectronics Physics Cyclotron Nanotechnology Crystallography

Metrics

7
Cited By
0.94
FWCI (Field Weighted Citation Impact)
10
Refs
0.70
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Ion-surface interactions and analysis
Physical Sciences →  Engineering →  Computational Mechanics
Advanced Materials Characterization Techniques
Physical Sciences →  Engineering →  Biomedical Engineering

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