Eric EisenbraunMichael A. CarpenterRezina SiddiqueSebastian NaczasWanxue ZengLuo FuAlain E. Kaloyeros
Nanoscale (zero-thickness) thin film growth processes such as atomic layer deposition are under extensive development for potential use in key nanoelectronics applications. The unique characteristics of these processes make them potentially enabling for a number of emerging nanotechnology-driven technologies. This paper discusses several of these potential applications and highlights specific fields where ALD is being researched.
Kevin J. HughesJianjun ChengKavita A. IyerKrittika RalhanMagesh GanesanChia‐Wei HsuYutao ZhanXinning WangBowen ZhuMenghua GaoHuaimin WangYue ZhangJiaxing HuangQiongqiong Angela Zhou