JOURNAL ARTICLE
SUPERCONDUCTING PROPERTIES OF NIOBIUM-TITANIUM-NITRIDE THIN FILMS
J. R. GavalerD. W. DeisJ. K. HülmC. K. Jones
Year: 1969 Journal: Applied Physics Letters Vol: 15 (10)Pages: 329-331 Publisher: American Institute of Physics
Abstract
A series of Nb–Ti–N films have been prepared, with various Nb/Ti ratios, by a high purity, reactive sputtering process. A maximum in transition temperature (at ∼ 15.5°K) has been obtained for a composition of Nb0.5Ti0.5N. Critical field and critical current measurements indicate a degradation in these properties with increasing titanium content, contrary to results reported previously.
Keywords:
Sputtering Titanium Materials science Niobium Niobium nitride Superconductivity Nitride Thin film Titanium nitride Metallurgy Degradation (telecommunications) Critical field Analytical Chemistry (journal) Composite material Condensed matter physics Nanotechnology Chemistry Electronic engineering Layer (electronics)
Metrics
23
Cited By
0.91
FWCI (Field Weighted Citation Impact)
8
Refs
0.68
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Physics of Superconductivity and Magnetism
Physical Sciences → Physics and Astronomy → Condensed Matter Physics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Particle accelerators and beam dynamics
Physical Sciences → Engineering → Aerospace Engineering
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