Interdiffusion in vacuum-deposited dielectric thin films

Y.J. Lee; J.H. Lee; Y.Y. Lee; Yonghai Kang; Y.S. Kim; Soonnam Kwon; Kwangsik Jeong; S.N. Kwon; K. Jeong

doi:10.1016/s0030-4018(01)01071-9

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Interdiffusion in vacuum-deposited dielectric thin films

Y.J. Lee J.H. Lee Y.Y. Lee Yonghai Kang Y.S. Kim Soonnam Kwon Kwangsik Jeong S.N. Kwon K. Jeong

Year: 2001 Journal: Optics Communications Vol: 190 (1-6)Pages: 211-220 Publisher: Elsevier BV

DOI: 10.1016/s0030-4018(01)01071-9

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Keywords:

Materials science Dielectric Thin film Diffusion Coating X-ray photoelectron spectroscopy Optical coating Optics Optoelectronics Composite material Nanotechnology Nuclear magnetic resonance

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Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Interdiffusion in vacuum-deposited dielectric thin films

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