Thermal nanoimprint resist for the fabrication of high-aspect-ratio patterns

Martin Messerschmidt; A. Schleunitz; Christian Spreu; T. Werner; Marko Vogler; F. Reuther; A. Bertz; Helmut Schift; Gabi Grützner

doi:10.1016/j.mee.2012.07.098

JOURNAL ARTICLE

Thermal nanoimprint resist for the fabrication of high-aspect-ratio patterns

Martin Messerschmidt A. Schleunitz Christian Spreu T. Werner Marko Vogler F. Reuther A. Bertz Helmut Schift Gabi Grützner

Year: 2012 Journal: Microelectronic Engineering Vol: 98 Pages: 107-111 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2012.07.098

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Keywords:

Resist Materials science Fabrication Nanoimprint lithography Copolymer Thermal stability Bilayer Polymerization Nanotechnology Chemical engineering Composite material Layer (electronics) Membrane Polymer Chemistry

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Thermal nanoimprint resist for the fabrication of high-aspect-ratio patterns

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