Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

Lijian Meng; A. Azevedo; M.P. dos Santos

doi:10.1016/0042-207x(94)00052-2

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Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

Lijian Meng A. Azevedo M.P. dos Santos

Year: 1995 Journal: Vacuum Vol: 46 (3)Pages: 233-239 Publisher: Elsevier BV

DOI: 10.1016/0042-207x(94)00052-2

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Keywords:

Materials science Titanium nitride Scanning electron microscope Titanium Sputter deposition Nitride Sputtering Cavity magnetron Deposition (geology) Analytical Chemistry (journal) Electrical resistivity and conductivity Thin film Metallurgy Composite material Nanotechnology Chemistry Layer (electronics)

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

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