JOURNAL ARTICLE

Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering

Lijian MengA. AzevedoM.P. dos Santos

Year: 1995 Journal:   Vacuum Vol: 46 (3)Pages: 233-239   Publisher: Elsevier BV
Keywords:
Materials science Titanium nitride Scanning electron microscope Titanium Sputter deposition Nitride Sputtering Cavity magnetron Deposition (geology) Analytical Chemistry (journal) Electrical resistivity and conductivity Thin film Metallurgy Composite material Nanotechnology Chemistry Layer (electronics)

Metrics

32
Cited By
3.45
FWCI (Field Weighted Citation Impact)
25
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
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