Bo XieYonghao XingYanshuang WangJian ChenDeyong ChenJunbo Wang
This paper presents the fabrication and characterization of a resonant pressure microsensor based on SOI-glass wafer-level vacuum packaging. The SOI-based pressure microsensor consists of a pressure-sensitive diaphragm at the handle layer and two lateral resonators (electrostatic excitation and capacitive detection) on the device layer as a differential setup. The resonators were vacuum packaged with a glass cap using anodic bonding and the wire interconnection was realized using a mask-free electrochemical etching approach by selectively patterning an Au film on highly topographic surfaces. The fabricated resonant pressure microsensor with dual resonators was characterized in a systematic manner, producing a quality factor higher than 10,000 (~6 months), a sensitivity of about 166 Hz/kPa and a reduced nonlinear error of 0.033% F.S. Based on the differential output, the sensitivity was increased to two times and the temperature-caused frequency drift was decreased to 25%.
Zhenyu LuoDeyong ChenJunbo WangYinan LiJian Chen
Jiahui YaoChao ChengXue HanXingyu LiYulan LuBo XieJunbo WangDeyong ChenJian Chen
陈德勇 CHEN De-yong曹明威 CAO Ming-wei王军波 WANG Jun-bo焦海龙 JIAO Hai-longJian Zhang
Yahao GaoXiangming LiuSimin PengWei ZhangYufei LiuYao WangZhengwei WuChunrong PengShanhong Xia
Hailong JiaoBo XieJunbo WangDeyong ChenJian Chen