Pulsed laser deposited alumina thin films

R. Boidin; Tomáš Halenkovič; Virginie Nazabal; Ludvı́k Beneš; Petr Němec

doi:10.1016/j.ceramint.2015.09.048

ScienceGate Book Chapters

JOURNAL ARTICLE

Pulsed laser deposited alumina thin films

R. Boidin Tomáš Halenkovič Virginie Nazabal Ludvı́k Beneš Petr Němec

Year: 2015 Journal: Ceramics International Vol: 42 (1)Pages: 1177-1182 Publisher: Elsevier BV

DOI: 10.1016/j.ceramint.2015.09.048

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Thin film Amorphous solid Argon Refractive index Pulsed laser deposition Deposition (geology) Void (composites) Surface roughness Porosity Laser Surface finish Composite material Vacuum deposition Analytical Chemistry (journal) Optics Torr Optoelectronics Nanotechnology Crystallography

Metrics

192

Cited By

2.04

FWCI (Field Weighted Citation Impact)

Refs

0.87

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

High-Temperature Coating Behaviors

Physical Sciences → Engineering → Aerospace Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Pulsed laser deposited alumina thin films

Metrics

Citation History

Topics

Related Documents

Pulsed laser deposited nanocrystalline ZnO thin films

Pulsed laser deposited stoichiometric ZnO thin films

Cross-Sectional Nanoindentation of Alumina Thin Films Deposited by Pulsed Laser Deposition Process

Pulsed plasma-assisted PVD sputter-deposited alumina thin films

Characterizations of pulsed laser deposited SiC thin films