Silicon Nanomachining by Scanning Probe Lithography and Anisotropic Wet Etching

Jeng-Tzong Sheu; Hsueh-Tao Chou; W. L. Cheng; Chia-En Wu; L. S. Yeou

doi:10.1007/978-1-4757-5791-0_8

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Silicon Nanomachining by Scanning Probe Lithography and Anisotropic Wet Etching

Jeng-Tzong Sheu Hsueh-Tao Chou W. L. Cheng Chia-En Wu L. S. Yeou

Year: 2002 Microsystems Pages: 157-174 Publisher: Springer Nature

DOI: 10.1007/978-1-4757-5791-0_8

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Keywords:

Materials science Silicon Etching (microfabrication) Dry etching Scanning probe microscopy Reactive-ion etching Substrate (aquarium) Optoelectronics Lithography Nanolithography Isotropic etching Nanotechnology Fabrication

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Force Microscopy Techniques and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Silicon Nanomachining by Scanning Probe Lithography and Anisotropic Wet Etching

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