G. V. LiE. V. AstrovaА. М. RumyantsevV. B. VoronkovAlesya V. ParfenevaV. A. TolmachevТ. Л. КуловаА. М. Скундин
Scientific and methodical fundamentals are developed for the technology of manufacturing of microstructured Si anodes based on macroporous silicon. The main technological processes include the electrochemical etching of single-crystal silicon wafers that allows obtaining an ordered lattice of cylindrical macropores with a cavity between the porous layer and support, anisotropic shaping, formation of a copper contact, and separation of the silicon structure from the support. Microstructures are manufactured in the form of a grid, columns, and zigzags with thin monodispersed walls of different crystallographic orientation. The possibility of repeated use of the Si support for anodic treatment and the manufacturing of several anodic structures from a single plate Si wafer is shown. The performed electrochemical tests demonstrate that the anodes manufactured according to the developed technology sustain hundreds of charge–discharge cycles.
Qizhen XiaoQing ZhangYu FanXinghui WangRahmat Agung Susantyoko
Christian SämannKaterina KelesiadouSeyedeh Sheida HosseiniounMario WachtlerJürgen KöhlerKai Peter BirkeM.B. SchubertJ.H. Werner
А. А. ЛешокД. А. СасиновичВ. Е. Борисенко
Ranganath TekiMoni Kanchan DattaRahul KrishnanThomas ParkerToh‐Ming LuPrashant N. KumtaNikhil Koratkar