MoS/sub 2/ thin films deposited by RF magnetron sputtering

Abstract

Molybdeum disulfide (MoS/sub 2/) is a widely used solid lubricant material for space and bearing applications. In this study, the deposition of MoS/sub 2/ thin films by RF magnetron sputtering was studied with regard to the microstructural change and mechanical properties. The coating parameters, such as working pressure, RF power, substrate temperature, and bias voltage, were varied to determine how these parameters affected the film morphology and mechanical properties of the deposited films. The best wear properties and critical load were observed with the film deposited at 70/spl deg/C. The critical load increased with increase of sputter etching time.