Structural and optical properties of electron‐beam evaporated Al₂O₃‐doped V₂O₅ thin films for various applications

Abstract

Abstract The solid‐state reaction method was used to prepare tablets of (V 2 O 5 ) 100− x (Al 2 O 3 ) x with x = 5, 10, 15, 20 wt. %. Thin films of Al 2 O 3 ‐doped V 2 O 5 were deposited onto glass substrates using an electron‐beam evaporation technique. The influence of doping and annealing temperature on the structural and optical characteristics has been investigated in detail. Optical properties of the films were studied extensively in the wavelength range 200–2500 nm from the measurements of the optical transmittance ( T ) and optical reflectance ( R ). It was observed that the optical properties such as transmittance, reflectance, optical bandgap, and refractive index of (V 2 O 5 ) 100− x (Al 2 O 3 ) x films were strongly affected by the ratio of Al 2 O 3 and the temperature of annealing.