Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

Kunio Awazu; Makoto Fujimaki; Satoshi Ishii; Kunihiro Shima; Ken-ichi Nomura; Yoshimichi Ohki

doi:10.1109/imnc.2002.1178547

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Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

Kunio Awazu Makoto Fujimaki Satoshi Ishii Kunihiro Shima Ken-ichi Nomura Yoshimichi Ohki

Year: 2003 Pages: 68-69

DOI: 10.1109/imnc.2002.1178547

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Abstract

The authors introduce work on 2D and 3D nano/microfabrication with MeV ion beam irradiation on a-SiO/sub 2/ and rutile single crystal TiO/sub 2/. The electronic stopping of the ions is responsible for the track formation. The latent tracks atomic structure and enhanced etch rate are identified.

Keywords:

Ion Materials science Microfabrication Ion track Fabrication Nano- Microstructure Rutile Ion beam Irradiation Nanostructure Nanotechnology Optoelectronics Chemistry Metallurgy Nuclear physics Composite material Physics

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Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

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Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

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