JOURNAL ARTICLE

Optical and Electrical Properties of V2O5 Thin Films Fabricated by Pulsed Laser Deposition

Yusuke IidaHideaki TakashimaYoshinori Kanno

Year: 2008 Journal:   Japanese Journal of Applied Physics Vol: 47 (1S)Pages: 633-633   Publisher: Institute of Physics

Abstract

V2O5 thin films were prepared by pulsed laser deposition (PLD). We studied the response of the phosphorescence energy of the double bond between vanadium and oxygen (V=O) on basicity. The results show that the insertion of Li+ leads to a blue shift of the wavelength for the V=O peak with increasing electric charge. The V2O5 thin films, soaked in dimethylsulfone (DMSO2), acetone, and dilute HNO3 solutions, also lead to a blue shift of the wavelength for the V=O peak. In addition, the electrical properties of the V2O5 thin films were studied by atomic force microscopy (AFM). The current–voltage (I–V) characterization of V2O5 thin films (Ts = room temperature, PO2 = vacuum) shows erasing, metastable reproducing and recording states. The reversibility of phase transitions for V2O5 thin films depends on the conditions for fabrication by PLD.

Keywords:
Thin film Pulsed laser deposition Materials science Analytical Chemistry (journal) Vanadium Deposition (geology) Vanadium oxide Electrical resistivity and conductivity Optoelectronics Nanotechnology Chemistry

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